PLASMA PROCESSING APPARATUS AND PROCESSING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus and a processing method thereof for preventing a breakdown of a lower portion of vacuum vessels, such as a vacuum vessel and a pump caused by an abnormal electrical discharge like an arc electrical discharge or the like.

SOLUTION: Plasma discharged toward the lower portion of the vacuum vessels can be restrained through positioning a lattice-like conductive shield around an electrode, on which a substrate is positioned and changing a flow ratio of a gas fed into the vacuum vessels.

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