发明名称 |
METHOD FOR FORMING MICRO GROOVE STRUCTURE |
摘要 |
A method of forming a micro groove structure according to the invention has the steps of: (a) forming a mask pattern on a substrate capable of being subjected to dry etching; (b) dry etching the substrate having the mask pattern formed thereon; (c) vapor-phase forming a thin film of a masking material for the dry etching, on a non-etched surface portion of the substrate after the dry etching; and (d) dry etching the substrate having the thin film formed thereon. The steps (a) to (d) are carried out successively.
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申请公布号 |
CA2423527(A1) |
申请公布日期 |
2003.09.26 |
申请号 |
CA20032423527 |
申请日期 |
2003.03.26 |
申请人 |
NIPPON SHEET GLASS CO., LTD. |
发明人 |
NAKAZAWA, TATSUHIRO;TSUNETOMO, KEIJI |
分类号 |
G02B6/122;H01L21/768;(IPC1-7):G03F7/00;B81C1/00;G02B5/18;G03F7/36 |
主分类号 |
G02B6/122 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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