| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin-film magnetic head, which is capable of easily lifting-off a resist layer patterned by an electron beam, a method for manufacturing a magneto-resistive element aggregate, and a method for manufacturing a magnetic head slider. SOLUTION: According to the method for manufacturing a thin-film magnetic head, an electron beam resist 49 is irradiated with an electron beam to form a resist layer 70 having a main pattern 72 and a plurality of projected parts 74 extended from its outer edge to the surroundings. The latent image pattern of the resist layer 70 is formed by the emitted electron beam and electrons scattered on the base layer 42 of the electron beam. Further, the width of the base 42 side by the scattered electrons on the base layer is smaller on the projected part 74 than on the primary pattern 72. COPYRIGHT: (C)2003,JPO
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