| 摘要 |
A phase shift mask formed by extracting connecting nodes such as ends, corners and intersections, of a random interconnection pattern is multiple-exposed, along with a phase shift mask for exposing other regions, onto the same resist film through a projection optical system. Alternatively, an arbitrary pattern is quantized to two to four phase shift masks and similarly multiple-exposed. The interconnection pitch of a logic LSI can be reduced by optical lithography and a high-performance LSI can be fabricated at low cost and with high throughput while suppressing an interconnection lag. |
