| 摘要 |
PROBLEM TO BE SOLVED: To dispense with an inserting/retreating mechanism used for inserting or retreating a mask mark microscope making an exposure system simple in structure. SOLUTION: The mask mark microscope 24 is provided on a work stage 13 and set movable together with the work stage 13. A reference mark BM is provided on the entrance part 24b of the mask mark detection microscope 24. A positional relation among a work mark microscope 15, the mask mark microscope 24, and the work stage 13 is ascertained. When a mask M and a work W are aligned with each other, the work stage 13 is moved, and the position of a work mark WAM is detected by the work mark microscope 15. Then, the work stage 13 is moved, and the projected position of the mask mark MAM is detected by the mask mark microscope 24. The work stage 13 is driven, to make the positions of the work mark and the mask mark MAM coincide with each other, for aligning the mask M and the work W with each other. COPYRIGHT: (C)2003,JPO |
