| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method and an aligner, which are capable of improving a projection optical system, in optical characteristics or improving the relative position of a wafer to the projection optical system, in correction the reliability, using a simple structure. SOLUTION: In the exposure method, the image of a pattern formed on a reticle is transferred onto a substrate by projection through the intermediary of a projection optical system as a reticle, and a substrate is scanned synchronously. The exposure method comprises a first step of measuring the surface form of the reticle at an exposure position and holding the measured data as correction data, a second step of controlling the synchronous scanning operation on the basis of the correction data, and a third step of repeatedly measuring the surface form of the reticle and updating the correction data. COPYRIGHT: (C)2003,JPO |
