| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of causing CVD thin film to be deposited by which a vaporizer can be used for a long period, without causing clogging, etc., and in addition, a raw material can be supplied stably to a reaction section. SOLUTION: In this method, a prescribed CVD thin film is formed by making a CVD raw material solution and a gas flow to a CVD chamber for an appropriate period of time through the vaporizer. In this method, only a solvent capable of dissolving deposits adhering to the vaporizer is made to flow to the vaporizer, by switching the gas from the outlet of the vaporizer to gas the evacuation side, after the prescribed period of time has elapsed. COPYRIGHT: (C)2003,JPO
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