| 摘要 |
<p>A method for indicating the periphery line (1) of a patch (2) of an optionally resilient surface layer (3) of a substrate object, which patch is intended to be removed in a step, which may cause a change of the appearance of the surface, which method comprises the application on the surface of an adhesive mask, comprising an outer, 'negative' (4a), and/or optionally an inner, slat/'positive' (4b), mask component, comprising one or more layers of a sheet material, which can be brought to adhere to the surface of the object, wherein the negative mask (4a) comprises a main opening (7) with a borderline, which forms an inner borderline (5a) of the mask, and the positive mask (4b) comprises a slab with a borderline, which forms an outer borderline (5b) of the mask, said inner and/or outer borderlines having essentially the shape of the intended periphery line (1) of the patch (2) of the surface layer intended to be removed, said main opening or slab having circular or preferably elongated, non-circular shape, preferably with a ratio of lengthwise extension to transverse extension of at least 1,5, at least 2 or at least 3 and optionally at most 10.</p> |
