发明名称 |
MANUFACTURING DEVICE AND MANUFACTURING METHOD USING THE SAME FOR POLYCRYSTALLINE SEMICONDUCTOR SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing device for a polycrystalline semiconductor substrate where a crystalline semiconductor substrate having excellent crystal quality and a uniform thickness can be manufactured without increasing its manufacturing cost. SOLUTION: The manufacturing device for a polycrystalline semiconductor substrate is provided with a crucible which has an opening at its top and houses a semiconductor material and provided with a base body which vertically moves in and out through the opening of the crucible and besides can rotate around its axis. The crucible has a heating source for melting the semiconductor material housed, and the base body has an adhesion part to which the semiconductor material in a molten state is adhered when the base body is lowered into the crucible. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003267716(A) |
申请公布日期 |
2003.09.25 |
申请号 |
JP20020068688 |
申请日期 |
2002.03.13 |
申请人 |
SHARP CORP |
发明人 |
SHINDOU TASUKE;NUNOI TORU |
分类号 |
C01B33/02;(IPC1-7):C01B33/02 |
主分类号 |
C01B33/02 |
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