| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition which simultaneously satisfies such characteristics as sensitivity, resolving power, pattern shape and line edge roughness when an electron beam or X-rays are used. <P>SOLUTION: The negative resist composition comprises (A) an alkali-soluble polymer, (B) a crosslinking agent which crosslinks with the alkali-soluble polymer (A) under the action of an acid and (C) a specified acid generator which generates an acid upon irradiation with an actinic ray or a radiation. <P>COPYRIGHT: (C)2003,JPO |
