发明名称 MEASURING INSTRUMENT
摘要 PROBLEM TO BE SOLVED: To prevent a measured result from being dispersed by unevenness of a film thickness in a thin film layer, dust on the thin film layer and the like, in a measuring instrument such as a surface plasmon resonance measuring instrument. SOLUTION: In this measuring instrument provided with a dielectric block 10, the thin film layer 12 formed on one face thereof to contact with a sample, a light source 14 for generating light beam 13, an incident optical system 15 for making the beam 13 get incident into the dielectric block 10 at an incident angle by which a total reflection condition is attained in an interface 10b between the dielectric block 10 and the thin film layer 12, and a photo detecting means 17 for detecting the light beam 13 total reflected in the interface 10b, means 32, 33 are provided to move the optical system 15 and the dielectric bock 10 relatively so as to change an incident position of the beams 13 in the interface 10b, and a plurality of data corresponding to intensities of the total- reflected beams, output respectively by the photo detecting means 17 when the incident positions of the beam 13 are brought into different conditions is processed statistically by a computing means 20, so as to acquire one representative data corresponding to the intensity. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003270130(A) 申请公布日期 2003.09.25
申请号 JP20020068357 申请日期 2002.03.13
申请人 FUJI PHOTO FILM CO LTD 发明人 KIMURA TOSHIHITO
分类号 G01N21/27;(IPC1-7):G01N21/27 主分类号 G01N21/27
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