| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve a using efficiency of an electron beam and to reduce a power loss of a device by reducing the quantity of the electron beam lost by being shielded by a mask, regardless of the size of the irradiation width of the electron beam to an irradiating object. <P>SOLUTION: This electron beam irradiation device is equipped with a mask driving device 36 for moving the mask 22 and changing its opening width WM, and a control device 30 having a function for performing following controls based on set values of the irradiation width WI and an irradiation dose D of the electron beam 6 to the irradiation object 26, and an acceleration voltage VA of the electron beam 6: (a) a function for controlling the mask driving device 36 in order to control the opening width WM of the mask to satisfy a relation that WM is approximately equal to WI; (b) a function for controlling a scanning power source 20 in order to control a scanning current IS outputted therefrom to satisfy IS=K<SB>1</SB>×VA×(WI+α), wherein K<SB>1</SB>is a constant and α is the scanning marginal width; and (c) a function for controlling a filament power source 16 in order to control a current IE of the electron beam generated from a filament 4 to satisfy IE=K<SB>2</SB>×D×WI, wherein K<SB>2</SB>is a constant. <P>COPYRIGHT: (C)2003,JPO |
