发明名称 High-pressure drying apparatus, high-pressure drying method and substrate processing apparatus
摘要 Liquid for prevention of substrate drying is supplied into a processing chamber so that a pool of the liquid is created as an anti-drying atmosphere in advance inside a processing chamber, and substrates, as they are dipped in the pool, are kept on stand-by in a substrate board. In this manner, air drying of the substrates which are kept on stand-by is prevented. When the number of the substrates in the substrate board reaches a certain number, the anti-drying atmosphere is removed from the processing chamber, which is followed by introduction of an SCF into the processing chamber and supercritical drying (high pressure drying) of all of the plurality of substrates inside the processing chamber, namely, batch supercritical drying.
申请公布号 US2003177659(A1) 申请公布日期 2003.09.25
申请号 US20030382616 申请日期 2003.03.04
申请人 DAINIPPON SCREEN MFG. CO., LTD. 发明人 SAITO KIMITSUGU;MURAOKA YUSUKE;KITAKADO RYUJI;MIYAKE TAKASHI;IWATA TOMOMI;MIZOBATA IKUO
分类号 F26B5/14;F26B9/06;F26B21/14;H01L21/00;H01L21/304;(IPC1-7):F26B3/00 主分类号 F26B5/14
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