发明名称 DEFECT INSPECTING METHOD AND APPARATUS BY IMAGE PROCESSING
摘要 <P>PROBLEM TO BE SOLVED: To solve the problem that specific patterns such as each kind of reference mark and test patterns are present on an electrode that is formed on a front plate and a rear plate in addition to a pattern section required for driving a PDP, and this sort of specific pattern being present in an inspection region is detected as 'a defect' in defect inspections and tact in a later review process increases unwillingly, and at the same time, needs to be judged to be non-defective, and reviewing a minute, common defect that may or may not be detected as a defect regardless of 'defect' in terms of resolution when imaging by a CCD camera or a detection limit size by algorithm, and at the same time, reviewing those that are judged to be common defects each time cause the tact to increase. <P>SOLUTION: After a failed portion was detected, a failure judgment step is provided before the review. Then, in the step, the combination between the central coordinates of the failed section and failed elements is compared with that between the central coordinates of the preset defective section and/or a non-defective section for excluding from review targets by a defect-inspecting method and a defect-inspecting apparatus. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003270087(A) 申请公布日期 2003.09.25
申请号 JP20020068048 申请日期 2002.03.13
申请人 TORAY IND INC 发明人 KOJIMA HIDEKI;IGUCHI YUICHIRO
分类号 G01N21/958;G01M11/00;G06T1/00;H01J9/42;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34 主分类号 G01N21/958
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