发明名称 |
Plasma reactor with plural independently driven concentric coaxial waveguides |
摘要 |
A plasma reactor includes a vacuum chamber having an interior and a pedestal within the chamber for supporting a semiconductor wafer to be processed. Gas distribution apparatus introduces a process gas into said chamber. Power is applied to the chamber by plural concentric coaxial waveguides outside of said chamber having an axis of propagation pointing toward the interior of said chamber and establishing corresponding annular zones of radiation within said chamber. The reactor further includes apparatus that can apply different levels of electromagnetic radiation power to different ones of the plural concentric coaxial waveguides.
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申请公布号 |
US2003178143(A1) |
申请公布日期 |
2003.09.25 |
申请号 |
US20020106703 |
申请日期 |
2002.03.25 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
PERRIN MARK |
分类号 |
H01J37/32;(IPC1-7):C23F1/00;C23C16/00 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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