| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus in which a large and flat plasma beam opposite to a work to be processed is formed and a uniform film forming processing is performed on the work to be processed by using the plasma beam. <P>SOLUTION: The plasma processing apparatus 10 has a vacuum chamber 12, a plasma source 14 and a electrode part 16. The plasma source 14 has two plasma guns 22a and 22b, and two sheet plasma deforming parts 24a and 24b, which are arranged in parallel, respectively. The electrode part 16 has two columner plasma deforming parts 50a and 50b, and two electrodes 24a and 24b, which are arranged in parallel, respectively. Two sheet plasma beams SPB1 and SPB2, deformed from columner plasma beams at respective sheet plasma deforming parts 24a and 24b, are made incident into the vacuum chamber 12 in the state that the sheet planes are in parallel. <P>COPYRIGHT: (C)2003,JPO |
