POSITION MEASURING SYSTEM WITH MULTIPLE BAR MIRRORS

摘要

A position measuring system is utilized for measuring a position of a stage positioned on a pedestal. As the stage is moved along a predetermined direction, a controlling device utilizes a first measuring apparatus to measure a moving direction of the stage during the first period. Then, the controlling device uses the moving direction measured by the first measuring apparatus to adjust the moving direction measured by the second measuring apparatus during the overlapping period of the first period and a second period. After adjusting the second measuring apparatus, the controlling device utilizes the second measuring apparatus to measure the moving direction of the stage during the second period.