DIFFRACTION OPTICAL ELEMENT, REFRACTION ELEMENT, ILLUMINATION OPTICAL DEVICE, EXPOSURE DEVICE, AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an illumination optical device which includes a diffraction optical element capable of forming the illuminance distribution of a substantially uniform orbicular zone shape on a surface to be irradiated and an illumination pupil surface and which can perform satisfactory orbicular zone illumination while suppressing light quantity loss. SOLUTION: The illumination optical device illuminates the surface to be irradiated (M, W) and is provided with a diffraction optical element (6) for converting an incident luminous flux into an orbicular luminous flux so as to form a secondary light source which has an illuminance distribution of the orbicular zone shape on the illumination pupil surface. The diffraction optical element is provided with a first basic diffraction element and a second basic diffraction element in which ring shape gratings having mutually almost the same shapes are formed. In the first basic diffraction element and the second basic diffraction element, the centers of ring shape gratings are eccentrically formed along a first direction and a second direction to the center of an outer shape, respectively. COPYRIGHT: (C)2003,JPO