发明名称 Coating process method and coating process apparatus
摘要 A coating process method in which a coating liquid is discharged onto the surface of a target substrate to be processed while rotating the target substrate so as to expand the coating liquid radially outward on the target substrate and, thus, to form a coated film comprises the step of detecting that the actual discharging of a coating liquid from a coating liquid discharging nozzle is started, and the step of controlling based on a signal of the detection at least one of the driving timing of a pump for allowing the coating liquid to be discharged from the coating liquid discharging nozzle, the operation timing of a valve mounted to a pipe for supplying the coating liquid into the coating liquid discharging nozzle, and the rotation starting or stopping timing of the target substrate.
申请公布号 US2003180444(A1) 申请公布日期 2003.09.25
申请号 US20030384629 申请日期 2003.03.11
申请人 TAKEKUMA TAKASHI;KOMETANI YASUYUKI;FUKUDA YOSHITERU;MINAMIDA JUNYA 发明人 TAKEKUMA TAKASHI;KOMETANI YASUYUKI;FUKUDA YOSHITERU;MINAMIDA JUNYA
分类号 H01L21/00;(IPC1-7):B05D3/12 主分类号 H01L21/00
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