发明名称 |
Coating process method and coating process apparatus |
摘要 |
A coating process method in which a coating liquid is discharged onto the surface of a target substrate to be processed while rotating the target substrate so as to expand the coating liquid radially outward on the target substrate and, thus, to form a coated film comprises the step of detecting that the actual discharging of a coating liquid from a coating liquid discharging nozzle is started, and the step of controlling based on a signal of the detection at least one of the driving timing of a pump for allowing the coating liquid to be discharged from the coating liquid discharging nozzle, the operation timing of a valve mounted to a pipe for supplying the coating liquid into the coating liquid discharging nozzle, and the rotation starting or stopping timing of the target substrate.
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申请公布号 |
US2003180444(A1) |
申请公布日期 |
2003.09.25 |
申请号 |
US20030384629 |
申请日期 |
2003.03.11 |
申请人 |
TAKEKUMA TAKASHI;KOMETANI YASUYUKI;FUKUDA YOSHITERU;MINAMIDA JUNYA |
发明人 |
TAKEKUMA TAKASHI;KOMETANI YASUYUKI;FUKUDA YOSHITERU;MINAMIDA JUNYA |
分类号 |
H01L21/00;(IPC1-7):B05D3/12 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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