| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming an optical thin film having excellent optical properties by laminating it to have a multilayered structure by reactive sputtering maintaining a high film deposition rate inherent in sputtering deposition. SOLUTION: When forming a band pass filter of a multilayered structure (LH)<SP>5</SP>2L(HL)<SP>5</SP>using a low-refractive-index L layer composed of SiO<SB>2</SB>film and a high-refractive-index H layer composed of Ta<SB>2</SB>O<SB>5</SB>film by the reactive sputtering method where a film-deposition section and an oxidation section are separated, an oxide film layer is formed on the previously formed SiO<SB>2</SB>film by using Ta<SB>2</SB>O<SB>5</SB>formed in the film-deposition section by the addition of gaseous oxygen to sputter gas. Then the addition of the gaseous oxygen to the sputter gas is suspended and film deposition is resumed, and the resultant metal Ta layer on a substrate 4 is oxidized by a microwave-excited plasma source 12 to form the Ta<SB>2</SB>O<SB>5</SB>film. In this way, the multilayered structure having the LH lamination as a unit can be formed. COPYRIGHT: (C)2003,JPO
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