| 摘要 |
PROBLEM TO BE SOLVED: To provide a stripping solution capable of removing copper oxide present on a copper surface without corroding metal copper. SOLUTION: The resist stripping solution composition contains (a) a fluorine compound and (b) a compound having at least one sulfur atom and at least one hydroxyl group per molecule, such as 1-thioglycerol, 3-(2-hydroxyethylthio)-2- hydroxy-propylmercaptan, thiodipropionic acid or 2-mercaptothiazoline. If necessary, the composition may contain: (c) a water-soluble organic solvent; and/or (d) water may be contained in the composition; and further (e) a basic compound. COPYRIGHT: (C)2003,JPO |
