VACUUM PLASMA GENERATOR

摘要

The aim of the invention is to provide a vacuum plasma generator (1) for depositing reactive layers with the aid of a vacuum plasma process, which operates reliably at high pulse power and is capable of preventing, to a great extent, arc discharges in the plasma process. The generator (1) is composed of a mains-supply rectifier (6) for rectifying the mains voltage, a DC-DC converter (7) for setting and/or adjusting the converter output voltage, in addition to a semiconductor full-bridge circuit (13) that is connected downstream of the converter (7) for generating pulses ranging between 1 and 500 kHz, whereby an isolating transformer (14) is connected within the full-bridge circuit (13) for galvanically decoupling the generator output.