| 发明名称 |
FULLERENE COATED COMPONENT OF SEMICONDUCTOR PROCESSING EQUIPMENT |
| 摘要 |
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a fullerene containing surface and process for manufacturing thereof. |
| 申请公布号 |
EP1346078(A1) |
申请公布日期 |
2003.09.24 |
| 申请号 |
EP20010995200 |
申请日期 |
2001.11.23 |
| 申请人 |
LAM RESEARCH CORPORATION |
发明人 |
O'DONNELL, ROBERT, J.;CHANG, CHRISTOPHER, C.;DAUGHERTY, JOHN, E. |
| 分类号 |
C01B31/02;B01J19/02;C23C16/44;H01J37/32;H01L21/3065;(IPC1-7):C23C16/02;C23C16/26;H01L21/00 |
主分类号 |
C01B31/02 |
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