| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for forming thin film capable of producing high definition patterns easily and efficiently, an apparatus for producing circuit pattern, a method for producing electronic appliance, an electronic appliance thereof and an apparatus and a method for producing resist pattern. SOLUTION: This apparatus 1 for forming thin film which forms a thin film by applying coating liquid L onto a substrate SUB is provided with a moving mechanism 4 which mounts the substrate SUB, moves the substrate along at least the first direction and, at the same time, changes angle with respect to the moving direction of the substrate, a droplet ejecting mechanism 3 having a droplet ejecting head 2 which ejects the coating liquid L onto the substrate and a controlling part C which controls at least one side of the droplet ejecting mechanism 3 and the moving mechanism 4. COPYRIGHT: (C)2003,JPO
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