发明名称 METHOD OF MANUFACTURING MICRO-STRUCTURE BODY
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a micro-structure body by combining a plurality of micro-structure layers, which easily removes residual substances generated in patterning. SOLUTION: A wet-etching process is carried out for the residual substances 80, such as a heavy compound generated when patterning a second structure layer made of resin by an O<SB>2</SB>etching process together with a removal layer 93 located above a first structure layer 51 serving as an actuator structure 33. Therefore, before removing a first sacrifice layer 91, the residual substances 80 can be removed together with the removal layer 93, so that the residual substances 80 may not enter the actuator structure 33, whereby the reliable micro-structure body can be manufactured with a sufficient yield. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003266395(A) 申请公布日期 2003.09.24
申请号 JP20020070941 申请日期 2002.03.14
申请人 SEIKO EPSON CORP 发明人 YAMAUCHI TAISUKE
分类号 G02B26/08;B81B3/00;B81C1/00;H01L21/3065;(IPC1-7):B81C1/00;H01L21/306 主分类号 G02B26/08
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