| 摘要 |
PURPOSE: A continuous plasma polymerizing apparatus is provided to effectively control transfer direction of substrate and current direction of raw gas and particularly enable simultaneous uniformed treatment of both sides of the substrate that is being moved by properly arranging gas injection port and gas exhaust port. CONSTITUTION: In a continuous plasma polymerizing apparatus comprising unwinding chamber, winding chamber, and one or more polymerization chambers, the continuous plasma polymerizing apparatus comprises at least one polymerization chamber(4) comprising a substrate introducing way through which the substrate is introduced into the chamber, and a substrate exit way through which the substrate is slipped out of the chamber, wherein any one way out of the substrate introducing way and substrate exit way is at a higher elevation inside the chamber compared with the other way; a metallic substrate(1) guided into the polymerization chamber(4) through the substrate introducing way; a gas injection port(2) for injecting reaction gas onto the surface of the metallic substrate in a plasma atmosphere so that a polymer polymerization film is formed on the metallic substrate; and a gas exhaust port(3) for exhausting the reaction gas after the injected reaction gas is reacted, wherein any one port out of the gas injection port and gas exhaust port is at a higher elevation inside the chamber compared with the other port, and the gas injection port and gas exhaust port are positioned at both sides of the metallic substrates respectively in such a way that they are oppositely directed to each other.
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