发明名称 |
Method of abrading silicon substrate |
摘要 |
A method of abrading a portion of a silicon substrate includes fluidizing abrasive particulate material with a first gas within a storage container, combining the gas fluidized abrasive particulate material with a stream of a second gas to provide a stream of the gas fluidized abrasive particulate material, and directing the stream of the gas fluidized abrasive particulate material at the silicon substrate to abrade the portion of the silicon substrate.
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申请公布号 |
US6623338(B2) |
申请公布日期 |
2003.09.23 |
申请号 |
US20010023784 |
申请日期 |
2001.12.17 |
申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
PETTIT THOMAS E.;SMITH JAMES DENNING |
分类号 |
B24B37/04;B24B57/04;(IPC1-7):B24C3/04 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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