发明名称 Method of abrading silicon substrate
摘要 A method of abrading a portion of a silicon substrate includes fluidizing abrasive particulate material with a first gas within a storage container, combining the gas fluidized abrasive particulate material with a stream of a second gas to provide a stream of the gas fluidized abrasive particulate material, and directing the stream of the gas fluidized abrasive particulate material at the silicon substrate to abrade the portion of the silicon substrate.
申请公布号 US6623338(B2) 申请公布日期 2003.09.23
申请号 US20010023784 申请日期 2001.12.17
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 发明人 PETTIT THOMAS E.;SMITH JAMES DENNING
分类号 B24B37/04;B24B57/04;(IPC1-7):B24C3/04 主分类号 B24B37/04
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