发明名称 |
Semiconductor laser device having thickened impurity-doped aluminum-free optical waveguide layers |
摘要 |
In a semiconductor laser device including an active region which is made of an aluminum-free material and a plurality of cladding layers made of at least one AlGaAs or AlGaInP material, the active region includes a quantum well layer and at least one optical waveguide layer; a portion of the at least one optical waveguide layer located on one side of the quantum well layer has a thickness of 0.25 mum or more; and the at least one optical waveguide layer, other than a portion of the at least one optical waveguide layer being located near the quantum well layer and having a thickness of at least 10 nm, is doped with impurity of 10<17 >cm<-3 >or more.
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申请公布号 |
US6625190(B1) |
申请公布日期 |
2003.09.23 |
申请号 |
US20000648807 |
申请日期 |
2000.08.28 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
HAYAKAWA TOSHIRO;FUKUNAGA TOSHIAKI;WADA MITSUGU |
分类号 |
H01S5/343;H01S5/20;H01S5/22;(IPC1-7):H01S3/19 |
主分类号 |
H01S5/343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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