发明名称 Semiconductor laser device having thickened impurity-doped aluminum-free optical waveguide layers
摘要 In a semiconductor laser device including an active region which is made of an aluminum-free material and a plurality of cladding layers made of at least one AlGaAs or AlGaInP material, the active region includes a quantum well layer and at least one optical waveguide layer; a portion of the at least one optical waveguide layer located on one side of the quantum well layer has a thickness of 0.25 mum or more; and the at least one optical waveguide layer, other than a portion of the at least one optical waveguide layer being located near the quantum well layer and having a thickness of at least 10 nm, is doped with impurity of 10<17 >cm<-3 >or more.
申请公布号 US6625190(B1) 申请公布日期 2003.09.23
申请号 US20000648807 申请日期 2000.08.28
申请人 FUJI PHOTO FILM CO., LTD. 发明人 HAYAKAWA TOSHIRO;FUKUNAGA TOSHIAKI;WADA MITSUGU
分类号 H01S5/343;H01S5/20;H01S5/22;(IPC1-7):H01S3/19 主分类号 H01S5/343
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