发明名称 |
Compact SRAM cell incorporating refractory metal-silicon-nitrogen resistive elements and method for fabricating |
摘要 |
A compact SRAM cell that incorporates refractory metal-silicon-nitrogen resistive elements as its pull-up transistors is described which includes a semi-conducting substrate, a pair of NMOS transfer devices formed vertically on the sidewalls of an etched substrate by a metal conductor providing electrical communication between an n<+> region in the substrate and a bitline on top, a pair of pull-down nMOS devices on the substrate connected to ground interconnects, and a pair of vertical high-resistive elements formed of a refractory metal-silicon-nitrogen and function as a load for connecting to Vdd. The invention further describes a method for fabricating such compact SRAM cell.
|
申请公布号 |
US6624526(B2) |
申请公布日期 |
2003.09.23 |
申请号 |
US20010872325 |
申请日期 |
2001.06.01 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CLEVENGER LAWRENCE;HSU LOUIS;WANG LI-KONG |
分类号 |
H01L21/8244;H01L27/11;(IPC1-7):H01L27/11;H01L29/00 |
主分类号 |
H01L21/8244 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|