| 发明名称 |
Fluorine-containing compounds with high transparency in the vacuum ultraviolet |
| 摘要 |
This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a process for the preparation thereof. |
| 申请公布号 |
AU2003218015(A8) |
申请公布日期 |
2003.09.22 |
| 申请号 |
AU20030218015 |
申请日期 |
2003.03.06 |
| 申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
DAVID JOSEPH JONES;ROGER HARQUAIL FRENCH;ROBERT CLAYTON WHELAND |
| 分类号 |
G03F7/039;C07C19/08;C10M101/00;G03F7/004;G03F7/20 |
主分类号 |
G03F7/039 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
