发明名称 |
Method of observation by transmission electron microscopy |
摘要 |
A method for observing defect in an amorphous material by transmission electron microscopy is disclosed. The method comprises the steps of: incident electron beam into the amorphous material; eliminating a generated diffraction wave to form an image only by a transmission wave coming through the amorphous material; and observing the image under an under-focus condition. A method for respectively observing an amorphous material and a crystalline material in a composite material containing both of the amorphous material and the crystalline material by transmission electron microscopy is also disclosed. when observing a defect in the amorphous material, electron beam is injected into the amorphous material, and a generated diffraction wave is eliminated, then an image is formed only by a transmission wave coming through the amorphous material to conduct observation thereof under an under-focus condition, while when observing the crystalline material, electron beam is injected into the crystalline material, and an image is formed by a generated diffraction wave and by a transmission wave coming through the crystalline material to conduct observation thereof.
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申请公布号 |
US2005042781(A1) |
申请公布日期 |
2005.02.24 |
申请号 |
US20040944842 |
申请日期 |
2004.09.21 |
申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.;NISSAN ARC, LTD. |
发明人 |
OGAWA SHINICHI;INOUE YASUHIDE;SHIMANUKI JUNICHI;MORI HIROTARO |
分类号 |
H01L21/66;G01N23/04;H01J37/21;H01J37/26;(IPC1-7):H01L21/66;H01L29/06;H01L31/032;H01L31/033 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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