| 摘要 |
FIELD: chemical industry; production of filter elements, catalysts and components for microelectronics. SUBSTANCE: reservoir 3 is filled with surfactant solution in nonpolar solvent and aqueous solution of metal salts. Reservoirs 12, 13 and 14 are filled respectively with liquid hydrocarbon, water-and-alcohol mixture and distilled water with cocks 16 closed. Then, mixing unit 4 of reservoir 3 is switched on. Solubilized organic aqueous dispersion of metal salt thus prepared is fed to reactor 1 and objects to be modified are placed in it at simultaneous delivery of inert gas from bottle 2 to reactor 1 with cock 11 open. Then, gamma-radiation ionizing source 5 is switched on with door 7 locked preliminarily. After disconnection of source 5, solution is removed from reactor 1 to regeneration unit via main 24 through absorbent 20 with cock 19 open; main 24 is formed by rectifying columns 21, 22 and 23 for regeneration of hydrocarbons, water-and-alcohol mixture and distilling and cleaning water. Purified hydrocarbon is admitted to main 31 via outlet pipe union 28 and then to reservoir 12 with cock 16 closed. After filling reservoir 12, reactor 1 and objects contained in are washed with water-and-alcohol mixture and distilled water from reservoirs 13 and 14. Upon completion of washing, door 7 is opened and modified objects are withdrawn from reactor 1. EFFECT: increased adsorbing capacity of material being modified; reduced consumption of organic solvents. 1 dwg
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