发明名称 HEAT TREATMENT EQUIPMENT FOR GLASS SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide heat treatment equipment for a glass substrate reducing heat loss from the heat treatment equipment, consequently increasing energy efficiency of the equipment, reducing temperature nonuniformity in a heating chamber, and stabilizing atmosphere in a clean room in the circumference of the equipment. SOLUTION: This heat treatment equipment is provided with the heating chamber 3 performing the heat treatment of the glass substrate 7 and characterized in having an attachment chamber 2 installed side by side with the heating chamber and letting the glass substrate wait for a prescribed time. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003262472(A) 申请公布日期 2003.09.19
申请号 JP20020066504 申请日期 2002.03.12
申请人 TORAY IND INC 发明人 ISHIGAMI HIROSHI;SARUWATARI HIROSHI
分类号 C03B32/00;F27B9/02;F27B9/12;(IPC1-7):F27B9/02 主分类号 C03B32/00
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