发明名称 |
VERTICAL TRANSISTOR AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A vertical transistor and a method for manufacturing the same are provided to be capable of improving frequency property and driving capability of a collector current by easily controlling the width of a base. CONSTITUTION: An N- epitaxial layer(12) is formed on a P-type substrate(2). An N- buried layer(4) is formed between the substrate and the epitaxial layer. A P++ buried layer(6) is formed between the N- buried layer(4) and the epitaxial layer(12). A P-type well is formed on the N- epitaxial layer. An N+ base region(16) is formed in the P-type well. A P+ emitter region(18) is formed in the base region. A P+ collector region(14) is connected to the P++ buried layer.
|
申请公布号 |
KR20030072951(A) |
申请公布日期 |
2003.09.19 |
申请号 |
KR20020012246 |
申请日期 |
2002.03.07 |
申请人 |
KEC CORP. |
发明人 |
KIM, CHANG GYUN;LEE, JEONG HWAN |
分类号 |
H01L29/732;(IPC1-7):H01L29/732 |
主分类号 |
H01L29/732 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|