发明名称 MASK HOLDER AND UV IRRADIATION APPARATUS USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a UV irradiation apparatus provided with a mask for shielding UV irradiation of an area except for a sealant forming area so as to harden the UV-hardening sealant without exerting bad influence on the characteristic of an alignment layer or a thin film transistor, and to provide a mask holder for effectively holding the mask. SOLUTION: The UV irradiation apparatus comprises: a substrate stage; a UV source part; the mask formed between the substrate stage and the UV source part; and the mask holder for holding the mask. The mask holder includes a lower part having a square frame and a mask supporting member supporting a mask, wherein the mask supporting member is in the square frame and has a plurality of first connecting portions, and an upper part having a plurality of second connecting portions to be aligned with the first connecting portions. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003262844(A) 申请公布日期 2003.09.19
申请号 JP20030017315 申请日期 2003.01.27
申请人 LG PHILLIPS LCD CO LTD 发明人 BYUN YOUNG SANG;PARK MOO YEOL;JUNG SUNG SU
分类号 G02F1/13;G02F1/1339;G03F7/20;H01L21/68;(IPC1-7):G02F1/13;G02F1/133 主分类号 G02F1/13
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