DEVICE AND METHOD FOR POLISHING, AND DETECTING METHOD FOR REST OF POLISHING

摘要

PROBLEM TO BE SOLVED: To easily perform additional polishing by performing additional polishing with high accuracy based on the measured amount of the rest of polishing and preventing the rest of polishing from oxidizing.

SOLUTION: This is a method for detecting the rest of polishing left when a metal film formed over lower layer metal wiring with an insulation film between is polished. The insulation film is irradiated with multi-wavelength, and the wavelength dependency of reflection coefficient of reflected light having a wavelength proximate to the thickness of the insulation film is measured, to measure the amount of the rest of polishing of the metal film.

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