METHOD OF MANUFACTURING SUBSTRATE HANDLING APPARATUS AND SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate handling apparatus, which does not pollute a treatment chamber by an arm for carrying a substrate, and a semiconductor device. SOLUTION: In the substrate handling apparatus which has a plurality of treatment chambers 12 and 14 for severally performing different kinds of treatments for the substrates, arms 20 and 22 for holding the substrates 10 are provided to correspond to each treatment chamber 12 and 14, and a stage 24 for replacing one arm 20 or 22 with the other corresponding to each treatment chamber 12 or 14 when inserting the substrates into each treatment chamber 12 and 14 are provided. COPYRIGHT: (C)2003,JPO