| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a supporting head for a new chemical and mechanical polishing device. <P>SOLUTION: A supporting head 100 comprises a housing 102, a base 104, a loading mechanism 108, a gimbal mechanism 106 and a substrate backing assembly 112. The substrate backing assembly comprises a supporting structure 114 placed under a base, a practically horizontal circular flexure 116 that is interconnected with the supporting structure as a base, and a flexible film 118 that is interconnected to the supporting structure. The flexible film has a fitting surface 274 for a substrate, and extends from right under the base to form a chamber 290. <P>COPYRIGHT: (C)2003,JPO |
