PLASMA TREATMENT DEVICE AND PLASMA TREATMENT METHOD EMPLOYING IT, DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To ensure stabilized treatment with high controllability at the time of performing treatment requiring power in a region below the effective range of a plasma excitation power supply in a plasma treatment device.

SOLUTION: The plasma treatment device comprising a plasma excitation power supply 10 and a plasma generation chamber 3 and performing desired plasma treatment on a plane 5 being treated is further provided with a mechanism 20 consuming power from the plasma excitation power supply 10 in addition to plasma generating power.

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