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发明名称
Novel photoresist polymer and photoresist composition containing it
摘要
申请公布号
KR100682169(B1)
申请公布日期
2007.02.12
申请号
KR19990031298
申请日期
1999.07.30
申请人
发明人
分类号
G03F7/039;C08F2/02;C08F2/06;C08F232/08;C08K5/00;C08L45/00;G03F7/075;G03F7/38;G03F7/40;H01L21/027
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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