| 摘要 |
PROBLEM TO BE SOLVED: To prevent reaction forces caused by movement of a stage from being transmitted to a projection lens or other parts of a photolithographic apparatus. SOLUTION: Reaction forces generated when a stage mechanism (10) is driven are not transmitted to a supporter (94) which supports the projection lens (92), are transmitted to a supporting structure (80) independent of the supporter (94). The stage mechanism (10) is a reticle stage, and the supporter (94) supports an interferometer unit (112) which determines the portion of the reticle stage. COPYRIGHT: (C)2003,JPO |
