发明名称 FUNCTIONAL RESIN AND PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a resin in which whose directional property, anisotropy, or the like to its optical transparency or photopermeability are given, a photosensitive resin composition using the resin, and a pattern formation method using the composition. SOLUTION: The resin is constituted of a unit-M described by formula (1): -[R<SP>3</SP>-(Y)<SB>p</SB>]<SB>n</SB>-R<SP>4</SP>, wherein Y is a group having an unsaturated bond; R<SP>3</SP>and R<SP>4</SP>are each an aromatic or non-aromatic ring group which may have a substitutional group, and n and p are 0 or 1. The resin may be a homopolymer or copolymer of a polymerizable compound described by formula (2), wherein A and B are each a bonding group; X is a spacer; R<SP>1</SP>is a hydrogen atom or a methyl group; R<SP>2</SP>is an alkylene group or an arylene group; a, b and m are each 0 or 1; -M group is the same as described by formula 1, but it does not occur that a and b are 0 simultaneously. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003261627(A) 申请公布日期 2003.09.19
申请号 JP20020065736 申请日期 2002.03.11
申请人 KANSAI RESEARCH INSTITUTE 发明人 YAMAKI SHIGERU
分类号 G03F7/033;C08F216/12;C08F220/10;C08F220/54;C08F226/02;G03F7/039;G03F7/38;H01L21/027 主分类号 G03F7/033
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