| 摘要 |
PROBLEM TO BE SOLVED: To provide an additive for photoresist and a photoresist composition which are excellent in transparency, particularly for ArF excimer light and which can improve resolution, dry etching property and sensitivity. SOLUTION: The additive for photoresist comprises one or more kinds of compounds expressed by general formula (I), (II) or (III). The chemically amplifying photoresist composition essentially comprises the additive for a photoresist, a polymer which is changed into soluble with an alkali by the effect of an acid, a compound which generates an acid by the effect of light, and a solvent dissolving these compounds. The composition is excellent in transparency, particularly for ArF excimer light, and can improve resolution, dry etching property and sensitivity. COPYRIGHT: (C)2003,JPO |
