发明名称 EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain an exposure device with which the quality of an image formed on a recording medium is improved. SOLUTION: An array refraction element 36 is arranged on the optical path of the laser beams L emitted from a plurality of semiconductor lasers LD and between the emitting port of the laser beam L of a fiber array part 30 and a recording film F, which is formed by arranging a pair of refraction members, which divides the laser beam L into plural beams in a subscanning direction and has a unit surface form and emits two laser beams by dividing an incident laser beam, by making the dividing directions of respective laser beams coincide with each other and in a straight line along respective dividing directions which coincide with each other, and a focal distance f, a wavelengthλand a width d are so decided that the value (f×λ)/d becomes a prescribed value or smaller, which is derived by dividing a product of the focal distance f of a focusing leans 38 and the wavelengthλof the laser beam L by the width d of the divided region of the laser beam L with respect to the dividing direction at a refraction member forming the array refraction element 36. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003262810(A) 申请公布日期 2003.09.19
申请号 JP20020063290 申请日期 2002.03.08
申请人 FUJI PHOTO FILM CO LTD 发明人 MIYAGAWA ICHIRO
分类号 B41J2/44;G02B26/08;G02B26/10;G02B27/28;(IPC1-7):G02B26/10 主分类号 B41J2/44
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