APPARATUS FOR REMOVING RESIDUAL CHARGE OF ELECTROSTATIC CHUCK AND METHOD THEREOF

摘要

An apparatus for removing residual charges of an electrostatic chuck and a removing method of the same are provided to neutralize residual charges from a wafer by using a dechucking module. A chamber(10) has predetermined volume and an exhaust hole formed at the bottom. An electrostatic chuck(20) includes a lamination structure of an upper insulating layer, an upper electrode for receiving a DC voltage, a lower insulating layer, and a lower electrode for receiving bias power. A coil part(30) is installed at an upper part of the chamber. A helium gas supply and exhaust unit improves thermal conductivity between the electrostatic chuck and the wafer and supplies an ionized gas to a rear surface of a wafer. A DC voltage module(60) is connected with the electrostatic chuck. A dechucking module(70) is connected with the electrostatic chuck in order to change alternately a positive voltage and a negative voltage.