发明名称 GAS-PLASMA TREATMENT OF IMPLANTS
摘要 An implant for use in biological/biomedical applications may be prepared by subjecting a substrate to a gas-plasma treatment. The substrate may be a biocompatible material, including metals, ceramics, and polymers. More specifically, the substrate may be a bioresorbable polymer. The gas-plasma treatment may include subjecting the substrate to a plasma formed by a reactive gas. The gas-plasma treatment may be performed for a chosen duration at a radio frequency within a temperature range, a pressure range, and a supplied energy range. The substrate may be exposed to living cells, such that some of the living cells become coupled to the substrate. Gas-plasma treatment parameters may be chosen such that the living cells coupled to the treated substrate produce more of a cellular product than living cells coupled to an untreated substrate.
申请公布号 WO03075790(A2) 申请公布日期 2003.09.18
申请号 WO2003US06942 申请日期 2003.03.06
申请人 THE UNIVERSITY OF TEXAS HEALTH SCIENCE CENTER AT SAN ANTONIO;AGRAWAL, C., MAULI;BAILEY, STEVEN, R.;POLAN, JODIE, L. 发明人 AGRAWAL, C., MAULI;BAILEY, STEVEN, R.;POLAN, JODIE, L.
分类号 A61F;A61F2/00;A61K45/00;A61L27/38;A61L27/50;B29C59/14;C07K14/52;C12N5/06;C12N5/08;C12N11/02;C12N11/08 主分类号 A61F
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