| 摘要 |
A dilution apparatus for continuously producing a diluted liquid sample, e.g., a chemical-mechanical polishing slurry, for analysis, e.g., particle size distribution, comprises a mixer manifold, a diluent-introducing means, e.g., a flow controlling device, for introducing a diluent, e.g., water, into the mixer manifold, and a liquid sample introducing means, e.g., a pump, for introducing the sample into the mixer manifold. The mixer manifold includes a plurality of ports for receiving a plurality of liquid samples from a plurality of sample points. The dilution apparatus can include a second mixer manifold for continuously producing a second diluted liquid sample, and it can be associated with one or more sensors operable to measure sample properties, e.g., an optical particle counter. The sensors can be operated simultaneously, and the measurements of the sensors can be compared. The dilution apparatus is capable of improving accuracy, reliability, repeatability, sensitivity and versatility of the associated sensors, and it is less complex than conventional dilution systems.
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