发明名称 Halogen acid corrosion inhibitor base
摘要 The reaction product of thiourea (alternatively, a primary amine), formaldehyde, and an aromatic ketone (e.g. acetophenone) in the presence of an organic acid (e.g. acetic acid) and a mineral acid has been found effective as a corrosion inhibitor base for metals in acid media, particularly fluids containing halogen acids. The corrosion inhibitor base can be prepared in nearly 100% yield, and is a more effective base, as contrasted with bases prepared with fatty acids as contrasted with lower molecular weight organic acids such acetic acid.
申请公布号 US2003176288(A1) 申请公布日期 2003.09.18
申请号 US20010885344 申请日期 2001.06.19
申请人 CIZEK ARTHUR 发明人 CIZEK ARTHUR
分类号 C09K8/54;C23F11/04;C23G1/06;(IPC1-7):C09K7/00 主分类号 C09K8/54
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