SYNCHRONOUS RASTER SCANNING LITHOGRAPHIC SYSTEM

摘要

A multi-beam synchronous raster scanning lithography system (500) includes a processor (504) that generates electrical signals representing a desired exposure pattern at an output. A multi-beam source (502) of exposing radiation generates a plurality of exposure beam. A beam modulator receives the electrical signals generated by the processor and modulates the plurality of exposing beams according to the desired exposure pattern. A beam deflector (506) deflects the plurality of exposure beams by a predetermined distance along a first axis, thereby exposing a plurality of pixels along the first axis with the desired exposure pattern. A translation stage moves the substrate a predetermined distance along a second axis to position the substrate for a subsequent exposure of pixels along the first axis that results in a desired overlapping exposure dose profile.