| 摘要 |
There is provided a mask pattern inspection system for detecting a defect candidate of a mask pattern and determining whether or not the defect candidate indicates a true defect. An image-recording section records a defect-detecting image obtained by a confocal microscope, and a defect candidate-detecting section extracts only a G signal from RGB signals included in the defect-detecting image to thereby detect a defect candidate. This makes it possible to detect the defect candidate from the defect-detecting image with accuracy. Further, a pattern data-processing section carries out an FIR filtering process on pattern data used for designing the mask to convert the pattern data to inspecting image data, and compares the defect-detecting image and the inspecting image data with each other. In this process, the inspecting image data is formed by the conversion such that it is adapted in image condition to the defect-detecting image, whereby it is possible to determine whether or not the defect candidate detected from the defect-detecting image indicates a true defect. |
